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专利名称：Semiconductor processing system发明人：Shigeru Ishizawa,Hiroaki Saeki,Yoshimitsu
Tamura,Shigetoshi Hosaka,MasahideItoh,Kazushi Tahara,Yasushi Kodashima
申请号：US10486511申请日：20040212
公开号：US20040238122A1公开日：20041202
专利附图：
摘要：A semiconductor processing system includes an intermediate structure (A, B)disposed between an atmospheric pressure entrance transfer chamber () and a vacuum
common transfer chamber (). The intermediate structure includes a transfer passage (A,B) for a target substrate (W) to pass therein. The transfer passage includes a first bufferchamber (), a middle transfer chamber (), and a second buffer chamber () detachablyconnected. An additional processing apparatus (A) is detachably connected to the middletransfer chamber. The intermediate structure is selectively arranged in first or secondstate. In the first state, the additional processing apparatus () performs a vacuumprocess, while the first buffer chamber () is a load-lock chamber. In the second state, theadditional processing apparatus (A) performs an atmospheric pressure process, while thesecond buffer chamber () is a load-lock chamber.
申请人：ISHIZAWA SHIGERU,SAEKI HIROAKI,TAMURA YOSHIMITSU,HOSAKASHIGETOSHI,ITOH MASAHIDE,TAHARA KAZUSHI,KODASHIMA YASUSHI
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