专利内容由知识产权出版社提供
专利名称：PLASMA PROCESSING DEVICE AND
OPERATION METHOD
发明人：Shigehiro MIURA,Hitoshi KATO,Jun
SATO,Takeshi KOBAYASHI,MasatoYONEZAWA
申请号：US151650申请日：20160526
公开号：US20160268105A1公开日：20160915
专利附图：
摘要：An operation method of a plasma processing device, includes performing a
plasma process on a workpiece by supplying first high frequency power of a
predetermined output to an electrode and generating plasma; and performing a chargestorage process before the plasma process when a time interval from an end of aprevious operation of the plasma processing device exceeds a predetermined interval,the charge storage process including supplying, to the electrode, second high frequencypower of a lower output than the predetermined output.
申请人：Tokyo Electron Limited
地址：Tokyo JP
国籍：JP
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