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专利名称：Vacuum depositing apparatus发明人：Hattori, Shintarou 302 Bell-Maison
Sakaguchi,Takahagi, Takayuki,Ishitani, AkiraTORE Research Center
申请号：EP88311500.8申请日：19881205公开号：EP0319347A3公开日：19900822
专利附图：
摘要：In a vacuum depositing apparatus for forming a film on a substrate (1) byevaporation, the present invention proposes a means to prevent impurities coming from
contamination in the vacuum vessel or impurities caused by thermal deterioration of thematerial from mixing into the vapor-deposited film. As this means to prevent impuritiesfrom mixing into the vapor-deposited film, a collimator (2c) or a separation mechanismshould preferably be provided between the substrate (1) and the spouting cell (2), or aspouting cell equipped with a specimen container unsealing means operable undervacuum should preferably be provided.
申请人：Research Development Corporation of Japan,Hattori, Shintarou,Takahagi,Takayuki,Ishitani, Akira
地址：5-2, Nagatacho 2-chome Chiyoda-ku Tokyo JP,302, Bell-Maison Sakaguchi 5-5-17, Ookaya Ootsu-shi Shiga JP,14-10, Senmachi 2-chome Ootsu-shi Shiga JP,Tore ResearchCenter 1-1, Sonoyama 1-chome Ootsu-shi Shiga JP
国籍：JP,JP,JP,JP
代理机构：Davies, Christopher Robert
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