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专利名称：Ceramic coating member for semiconductor
processing apparatus
发明人：Yoshiyuki Kobayashi,Takahiro
Murakami,Yoshio Harada,JunichiTakeuchi,Ryo Yamasaki,Keigo Kobayashi
申请号：US11688565申请日：20070320公开号：US078782B2公开日：20100119
专利附图：
摘要：Improving the resistance of members and parts disposed inside of vessels such
as semiconductor processing devices for conducting plasma etching treatment in astrong corrosive environment. A ceramic coating member for a semiconductor processingapparatus comprises a porous layer made of an oxide of an element in Group IIIb of thePeriodic Table coated directed or through an undercoat on the surface of the substrateof a metal or non-metal and a secondary recrystallized layer of the oxide formed on theporous layer through an irradiation treatment of a high energy such as electron beamand laser beam.
申请人：Yoshiyuki Kobayashi,Takahiro Murakami,Yoshio Harada,Junichi Takeuchi,RyoYamasaki,Keigo Kobayashi
地址：Tokyo JP,Tokyo JP,Akashi JP,Kobe JP,Kakogawa JP,Funabashi JP
国籍：JP,JP,JP,JP,JP,JP
代理机构：Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
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