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专利名称：Plasma processing method
发明人：Tomoyo Yamaguchi,Takashi Fuse,Kiwamu
Fujimoto,Masanobu Honda,KazuyaNagaseki,Akiteru Koh,Takashi
Enomoto,Hiroharu Ito,Akinori Kitamura
申请号：US10959152申请日：20041007
公开号：US20050103748A1公开日：20050519
专利附图：
摘要：A plasma processing method includes a step of preparing a process subject
having an organic layer on a surface thereof, and a step of irradiating the process subjectwith Hplasma to improve plasma resistance of the organic layer.
申请人：Tomoyo Yamaguchi,Takashi Fuse,Kiwamu Fujimoto,Masanobu Honda,KazuyaNagaseki,Akiteru Koh,Takashi Enomoto,Hiroharu Ito,Akinori Kitamura
地址：Nirasaki-shi JP,Nirasaki-shi JP,Nirasaki-shi JP,Nirasaki-shi JP,Nirasaki-shiJP,Nirasaki-shi JP,Beverly MA US,Nirasaki-shi JP,Nirasaki-shi JP
国籍：JP,JP,JP,JP,JP,JP,US,JP,JP
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