专利内容由知识产权出版社提供
专利名称：TIO2-CONTAINING SILICA GLASS AND
OPTICAL MEMBER FOR EUV LITHOGRAPHYUSING HIGH ENERGY DENSITIES AS WELL ASSPECIAL TEMPERATURE CONTROLLEDPROCESS FOR ITS MANUFACTURE
发明人：KOIKE, Akio,SAITO, Kenta,SHAO,
Long,IWAHASHI, Yasutomi,KIKUGAWA,Shinya
申请号：EP09714723.5申请日：20090226公开号：EP2247546B1公开日：20160224
摘要：The present invention provides a TiO2-SiO2 glass whose coefficient of linearthermal expansion in the range of the time of irradiation with EUV light is substantiallyzero when used as an optical member of an exposure tool for EUVL and which hasextremely high surface smoothness. The present invention relates to a TiO2-containingsilica glass having a TiO2 content of from 7.5 to 12 % by mass, a temperature at which acoefficient of linear thermal expansion is 0 ppb/°C, falling within the range of from 40 to110 °C, and a standard deviation (s) of a stress level of striae of 0.03 MPa or lower withinan area of 30 mm x 30 mm in at least one plane.
申请人：ASAHI GLASS CO LTD
地址：JP
国籍：JP
代理机构：Müller-Boré & Partner Patentanwälte PartG mbB
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