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专利名称：Method for producing and testing a
corrosion-resistant channel in a silicon device
发明人：James M. Harris,Sapna Patel申请号：US10929145申请日：20040827公开号：US07125739B2公开日：20061024
专利附图：
摘要：A method for producing a corrosion-resistant channel in a wetted path of asilicon device enables such device to be used with corrosive compounds, such as fluorine.A wetted path of a MEMS device is coated with either (1) an organic compound resistantto attack by atomic fluorine or (2) a material capable of being passivated by atomicfluorine. The device is then exposed to a gas that decomposes into active fluorinecompounds when activated by a plasma discharge. One example of such a gas is CF, aninert gas that is easier and safer to work with than volatile gases like ClF. The gas willpassivate the material (if applicable) and corrode any exposed silicon. The device is testedin such a manner that any unacceptable corrosion of the wetted path will cause thedevice to fail. If the device operates properly, the wetted path is deemed to be resistantto corrosion by fluorine or other corrosive compounds, as applicable.
申请人：James M. Harris,Sapna Patel
地址：969 Rose Ave. Menlo Park CA 94025 US,3410 Hart Common Fremont CA 94538US
国籍：US,US
代理机构：The Law Office of Tina M. Lessani
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