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专利名称：Substrate holding and rotating device,
substrate treatment apparatus including thedevice, and substrate treatment method
发明人：Hiroshi Kato申请号：US13596848申请日：20120828公开号：US09385020B2公开日：20160705
专利附图：
摘要：A substrate holding and rotating device includes: a turntable rotatable; arotative drive unit which rotates the turntable; a holding member which is provided on
the turntable and horizontally holds a substrate in upwardly spaced relation to theturntable; a vertically movable protection disk disposed between the turntable and asubstrate holding position; and a magnetic levitation mechanism including a first magnetattached to the protection disk, an annular second magnet which generates a repulsiveforce with respect to the first magnet, a support member which non-rotatably supportsthe second magnet, and a relative movement mechanism which moves the supportmember and the turntable relative to each other.
申请人：Hiroshi Kato
地址：Kyoto JP
国籍：JP
代理机构：Ostrolenk Faber LLP
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